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Department Of Physics Brain Korea 21 Physics Research Division And Institute Of Basic Science Sungky | 論文
- Relationship between C=C Bonds and Mechanical Properties of Carbon Rich Low-k Films deposited by Plasma Enhanced Chemical Vapor Deposition
- Characteristics under Bias-Temperature-Stress of Cu/Low-k a-SiCO: H Structures Prepared by Plasma Enhanced Chemical Vapor Deposition Using a Hexamethyldisilane Precursor and Cu Sputtering
- Effects of Post-Deposition Heat Treatment on the Properties of Low Dielectric Constant Plasma Polymerized Decahydronaphthalene Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition
- Properties of Low-k (k-2.05) Plasma Polymer Films Deposited by PECVD Using Decamethyl-cyclopentasiloxane and Cyclohexane as the Precursors
- Characteristics of Copper Diffusion into Low Dielectric Constant Plasma Polymerized Cyclohexane Thin Films
- Passivation of Organic Light-Emitting Diodes by the Plasma Polymerized para-Xylene Thin Film : Atoms, Molecules, and Chemical Physics
- Thickness Dependent Dielectric Property of BaTiO3/SrTiO3 Artificial Lattice
- Electrical Characteristics of Al/CeO_2(200)/Si(100) and Al/CeO_2(111)/Si(100) Metal-Insulator-Semiconductor Structure : Electrical Properties of Condensed Matter