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Department Of Electrical Engineering Osaka University | 論文
- Effect of pulsed substrate bias on film properties of SiO2 deposited by inductively coupled plasma chemical vapor deposition (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and FPD materials)
- Transcriptional Changes in Candida albicans Genes by Both Farnesol and High Cell Density at an Early Stage of Morphogenesis in N-acetyl-D-glucosamine Medium
- Analysis of subthreshold photo-leakage current in ZnO thin-film transistors using indium-ion implantation
- Olfactory neuroepithelioma : An immunohistochemical and ultrastructural study
- Familial ALS with G298S Mutation in TARDBP: A Comparison of CSF Tau Protein Levels with those in Sporadic ALS
- PROGRESSION OF LEADER SYSTEM IN LONG GAP LASER TRIGGERED DISCHARGES
- Low-Temperature Synthesis of Aligned Carbon Nanofibers on Glass Substrates by Inductively Coupled Plasma Chemical Vapor Deposition
- High-Quality Organic 4-Dimethylamino-N-methyl-4-stilbazolium Tosylate (DAST) Crystals for THz Wave Generation
- Application of Femtosecond Laser Ablation for Detaching Grown Protein Crystals from Glass Capillary Tube(METHODS)
- Low-Temperature Growth of Carbon Nanofiber by Thermal Chemical Vapor Deposition Using CuNi Catalyst
- Effect of RF Plasma Etching on Surface Damage in CsLiB_6O_ Crystal
- The committee for revision of the Clinical Practice Guidelines for Hepatocellular Carcinoma
- Enhanced nucleation of microcrystalline silicon thin films deposited by inductively coupled plasma chemical vapor deposition with low-frequency pulse substrate bias
- Intense Green Cathodoluminescence from Low-Temperature-Deposited ZnO Film with Fluted Hexagonal Cone Nanostructures
- SiO_2 Insulator Film Synthesized at 100℃ Using Tetramethylsilane by Inductively Coupled Plasma Chemical Vapor Deposition
- Effect of energetic particle bombardment on microstructure of zinc oxide films deposited by RF magnetron sputtering
- Influence of thermal annealing on microstructures of zinc oxide films deposited by RF magnetron sputtering
- Density Control of Carbon Nanotubes through the Thickness of Fe/Al Multilayer Catalyst
- Formation of Nanoscale Diamond Particles without Substrate Heating by Cathodic Arc Deposition
- Correlation between Field Electron Emission and Structural Properties in Randomly and Vertically Oriented Carbon Nanotube Films