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Department Of Applied Physics Tokai University | 論文
- Surface Wave Plasma Production Employing High-Permittivity Discharge Tube for Material Processing
- Etching Reactivity of Negative Ions Generated in Cl_2 Downstream Plasma
- Electron Energy Control in Inductively Coupled Plasma Employing Multimode Antenna
- Thin Film Detection Employing Frequency Shift in Sheath Current Oscillation
- Excitation of Sheath Oscillating Current by Superimposing Pulse Voltage
- Involvement of CD8^+RT1.B^+ and CD4^+RT1.B^+ Cells of Cervical Lymph Nodes in the Immune Response After Corneal Transplantation in the Rat
- BILATERAL CHOROIDAL OSTEOMAS ASSOCIATED WITH HISTIOCYTOSIS X
- SUPPRESSION OF CORNEAL GRAFT REJECTION BY SUBCONJUNCTIVAL INJECTION OF FK-506 IN A RAT MODEL OF PENETRATING KERATOPLASTY
- Silicon Etching Employing Negative Ion in SF_6 Plasma
- Warming Potential Reduction of C_4F_8 Using Inductively Coupled Plasma
- The Distribution of the Excess Vacancies in the Bulk at the Diffusion of Phosphorus into Silicon
- Phosphorus Diffusion in Silicon Free from the Surface Effect under Extrinie Conditions
- The Confirmation of the Surface Effect upon Phosphorus Diffusion into Silicon
- Determination of Diffusion Coefficient of Phosphorus in Silicon by Boltzmann-Matano's Method
- LaNi_5の表面改質による仕事関数の変化が水素吸蔵速度に及ぼす影響
- Development of a Noninvasive Method to Measure Intravascular and Intracardiac Pressure Differences Using Magnetic Resonance Imaging
- An Endothelial Nitric Oxide Synthase Inhibitor Aggravates CDL-Induced Acute Pancreatitis in Rats
- Quantum-Noise-Limited Self-Mixing Laser Measurements
- Physiological and Clinical Aspect of the Neuroretinal Circuit (6) : "Implications of Neuroimaging Technique With Regard to the Physiological and Pathological States of the Neuroretinal Circuit"
- イオンプレーティング法による窒化物膜の反応特性