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Central Research Laboratory, Hitachi Ltd | 論文
- Dielectric Properties of RF-Magnetron-Sputtered (Ba, Pb)(Zr, Ti)O_3 Thin Films
- Single-Target Sputtering Process for Lead Zirconate Titanate Thin Films with Precise Composition Control
- The Study of Ultrathin Tantalum Oxide Films before and after Annealing with X-Ray Photoelectron Spectroscopy
- Electrostrictive Materials for Ultrasonic Probes in the Pb(Mg_Nb_)O_3-PbTiO_3 System : F: FERROELECTRIC MATERIALS
- Electron Beam Direct Writing Technology for 64-Mb DRAM LSIs : Lithography Technology
- Electron Beam Direct Writing Technology for 64-Mb DRAM LSIs
- Negative Resist for i-Line Lithography Utilizing Acid Catalyzed Silanol-Condensation Reaction : Resist Material and Process
- Negative Resist for i-Line Lithography Utilizing Acid Catalyzed Silanol-Condensation Reaction
- Dissolution Behavior of Novolak/Dissolution Inhibitor Resist Systems in an Aqueous Base Developer : Resist Material and Process
- Three-dimensional STEM for observing nanostructures
- Position dependence of the visibility of a single gold atom in silicon crystals in HAADF-STEM image simulation
- Radiation Damage in SiO_2/Si Induced by VUV Photons : Etching and Deposition Technology
- Cerebral blood volume in the sleep measured by near-infrared spectroscopy
- A genome-wide CNV association study on panic disorder in a Japanese population
- A novel PET scanner with semiconductor detectors may improve diagnostic accuracy in the metastatic survey of head and neck cancer patients