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Bell Laboratories Lucent Technologies | 論文
- Single-Crystal Field-Effect Transistors Based on Organic Selenium-Containing Semiconductor
- A Fictive Stress Model Calculation of Creep Deformation of Zr-based Bulk Metallic Glass in the Glass Transition Region under a Constant Load
- Influence of In-Situ Nanoprecipitation on Constant Load Deformation in the Glass Transition Region of a Cu_Zr_Ti_ Bulk Metallic Glass
- Microforming of Bulk Metallic Glasses : Constitutive Modelling and Applications
- In Situ Observation of Stress-Induced Structural Disorder and Fictive Stress in a Zr_Al_Cu_ Glassy Alloy
- Heat of Evolution and Non-Newtonian Viscous Flow of Pd_Ni_P_ Glassy Alloy
- Transition from Linear to Nonlinear Viscoelasticity during Deformation in a Zr-based Glassy Alloy
- A Fictive Stress Model Calculationof Nonlinear Viscoelastic Behaviors in a Zr-Based Glassy Alloy : Stress Growth and Relaxation
- A Fictive Stress Model Calculation of Stress-Overshoot : A Nonlinear Viscoelastic Behavior in Metallic Glass
- Crystallization-Induced Phason Relaxation in Icosahedral Al-Pd-Mn Alloys
- Compositional Effect on the Two-Stage Enthalpy Relaxation of Metal-Metalloid Amorphous Alloys upon Annealing
- Superconducting Properties of Metastable bcc Solid Solution in Melt-quenched Zr-Ge Binary Alloys
- Young's Modulus of Fe-Si-B Amorphous Wires
- Local Structure and Glass Transition in Zr-Based Binary Amorphous Alloys
- Impurity Effects on the Electronic/Magnetic Ground States of Perovskite Manganites
- Interface Stability, Growth and Morphology in Icosahedral Quasi Crystals
- High K Dielectrics for CMOS and Flash
- Surface Analysis during Plasma Etching by Laser-Induced Thermal Desorption
- Effects of Discharge Frequency in Plasma Etching and Ultrahigh-Frequency Plasma Source for High-Performance Etching for Ultralarge-Scale Integrated Circuits
- Stability and Application to Multilevel Metallization of Fluorine-Doped Silicon Oxide by High-Density Plasma Chemical Vapor Deposition