スポンサーリンク
Aset Euv Laboratory C-o Ntt Atsugi Research Center | 論文
- Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors
- Modeling of In-Plane Distortion of Extreme Ultraviolet Lithography Mask in Flat State
- Thermal In-Plane Distortion Model of Mask for Extreme Ultraviolet Lithography during Periodic Scanning Exposure
- Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer : Surfaces, Interfaces, and Films
- Thermal Behavior along Depth of Extreme Ultraviolet Lithography Mask during Dry Etching : Surfaces, Interfaces, and Films
- Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process : Semiconductors
- Theoretical Analysis of Placement Error due to Absorber Pattern on Extreme Ultraviolet Lithography Mask
- Transmission Electron Microscopy Observation and Simulation Analysis of Defect-Smoothing Effect of Molybdenum/Silicon Multilayer Coating for Extreme Ultraviolet Lithography Masks
- Simulation of Multilayer Defects in Extreme Ultraviolet Masks
- Photon-Stimulated Ion Desorption Measurement of Organosilicon Resist Reactions in Extreme Ultraviolet Lithography
- Synergistic Actions of Exo-Type Cellulases in the Hydrolysis of Cellulose with Different Crystallinities
- Action of Exo- and Endo-Type Cellulases from Irpex lacteus on Valonia Cellulose
- A High-Density Phase-Change Optical Disk System Possessing Read/Write Compatibility with 90 mm Magneto-Optical Disks
- Secondary Calcium-Binding Parameter of Bacillus amyloliquefaciens α-Amylase Obtained from Inhibition Kinetics(ENZYMOLOGY, PROTEIN ENGINEERING, AND ENZYME TECHNOLOGY)
- Fine substrate Specificities of Four Exo-Type Cellulases Produced by Aspergillus niger, Trichoderma reesei, and Irpex lacteus on (1→3),(1→4)-β-D-Glucans and Xyloglucan
- Evaluation of the Waveguide Effect in Proximity X-Ray Lithography Using an Optical Trace Method