Secondary Calcium-Binding Parameter of Bacillus amyloliquefaciens α-Amylase Obtained from Inhibition Kinetics(ENZYMOLOGY, PROTEIN ENGINEERING, AND ENZYME TECHNOLOGY)
スポンサーリンク
概要
- 論文の詳細を見る
Calcium is required for the stabilization of α-amylase because of primary binding (essential binding), but has been shown to inhibit hydrolytic catalysis due to secondary binding at the catalytic site in the enzyme. The role of calcium in the hydrolysis of soluble amylose by Bacillus amyloliquefaciens α-amylase was characterized using the equilibrium dissociation constant (K_m) and k_<cat> for the hydrolytic catalysis. The enzymatic hydrolysis was inhibited by a relatively high concentration of calcium ions ([Ca^<2+>]≥2.0mM). The dissociation constant (K_m) was increased with increasing calcium ion concentration. Because k_<cat> was practically constant at the high calcium concentration range, a competitive inhibition kinetic model was applied to calculate the inhibition parameters in terms of the secondary calcium binding to the a-amylase. The enthalpy and entropy changes for the secondary binding were 54.8kJ/mol and 215J/mol・K, respectively, and these values suggest a strong entropic affinity for the bivalent ion binding to the enzyme. The thermodynamical analysis clearly shows the conformational changes in this a-amylase during the primary and secondary calcium ion binding.
- 社団法人日本生物工学会の論文
- 2003-09-25
著者
-
Tanaka Atsushi
Wakayama Medical University
-
Hoshino Eiichi
Aset Euv Laboratory C-o Ntt Atsugi Research Center
-
Hoshino E
Tokyo Research Laboratories Kao Corporation
-
Hoshino Eiichi
Tokyo Research Laboratories Kao Corporation
-
Tanaka Atsushi
Wakayama Research Laboratories Kao Corporation
関連論文
- Non-Invasive Assessment of Plaque Rupture by 64-Slice Multidetector Computed Tomography : Comparison With Intravascular Ultrasound
- Modeling of In-Plane Distortion of Extreme Ultraviolet Lithography Mask in Flat State
- Thermal In-Plane Distortion Model of Mask for Extreme Ultraviolet Lithography during Periodic Scanning Exposure
- Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer : Surfaces, Interfaces, and Films
- Thermal Behavior along Depth of Extreme Ultraviolet Lithography Mask during Dry Etching : Surfaces, Interfaces, and Films
- Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process : Semiconductors
- Theoretical Analysis of Placement Error due to Absorber Pattern on Extreme Ultraviolet Lithography Mask
- Transmission Electron Microscopy Observation and Simulation Analysis of Defect-Smoothing Effect of Molybdenum/Silicon Multilayer Coating for Extreme Ultraviolet Lithography Masks
- Synergistic Actions of Exo-Type Cellulases in the Hydrolysis of Cellulose with Different Crystallinities
- Action of Exo- and Endo-Type Cellulases from Irpex lacteus on Valonia Cellulose
- Secondary Calcium-Binding Parameter of Bacillus amyloliquefaciens α-Amylase Obtained from Inhibition Kinetics(ENZYMOLOGY, PROTEIN ENGINEERING, AND ENZYME TECHNOLOGY)
- Fine substrate Specificities of Four Exo-Type Cellulases Produced by Aspergillus niger, Trichoderma reesei, and Irpex lacteus on (1→3),(1→4)-β-D-Glucans and Xyloglucan
- Thermodynamic and Activation Parameters for the Hydrolysis of Amylose with Bacillus α-Amylases in a Diluted Anionic Surfactant Solution