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Advanced Semiconductor Research Center, AIST | 論文
- Simple Models on Enhancement of Mechanical Properties of Porous Silica Low-k Films by Tetramethylcyclotetrasiloxane(TMCTS) Vapor Annealing Treatment
- Bilayer Resist Method for Room-Temperature Nanoimprint Lithography
- Room Temperature Nanoimprint Technology Using Hydrogen Silsequjoxane (HSQ)
- Measurement of Adhesive Force Between Mold and Photocurable Resin in Imprint Technology
- Improvement of Imprinted Pattern Uniformity Using Sapphire Mold
- Uniformity in Patterns Imprinted Using Photo-Curable Liquid Polymer
- Bilayer Resist Method for Room-Temperature Nanoimprint Lithography