KATO Toshihiro | Optoelectronic Device Development Group, New Business Development Center, Daido Steel Co. Ltd.
スポンサーリンク
概要
- 同名の論文著者
- Optoelectronic Device Development Group, New Business Development Center, Daido Steel Co. Ltd.の論文著者
関連著者
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SAKA Takashi
Department of Electrical and Electronic Engineering, Daido Institute of Technology
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KATO Toshihiro
Optoelectronic Device Development Group, New Business Development Center, Daido Steel Co. Ltd.
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堀中 博道
大阪府立大学工学研究科
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ISEKI Maki
Department of Electrical and Electronic Engineering, Daido Institute of Technology
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HORINAKA Hiromichi
Department of Physics and Electronics, Faculty of Engineering, Osaka Prefecture University
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MATSUYAMA Tetsuya
Department of Physics and Electronics, Faculty of Engineering, Osaka Prefecture University
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Horinaka Hiromichi
Osaka Prefecture Univ. Sakai Jpn
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Horinaka Hiromichi
Department Of Electrical Engineering College Of Engineering University Of Osaka Prefecture
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Kato Takayoshi
Reseach Institute Of Electronics Shizuoka University
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Kato T
Graduate School Of Engineering Nagoya University
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Matsuyama Tetsuya
Department Of Physics And Electronics Faculty Of Engineering Osaka Prefecture University
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Iseki Maki
Department Of Electrical And Electronic Engineering Daido Institute Of Technology
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Matsuyama Tetsuya
Department Of Physics & Electronics Osaka Prefecture University
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Saka Takashi
Department of Applied Electronics, Daido Institute of Technology, 2-21 Daido-cho, Minami-ku, Nagoya 457-8531, Japan
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SAKA Takashi
Department of Applied Electronics, Daido Institute of Technology
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Horinaka Hiromichi
Department of Physics and Electronics, Faculty of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Sakai 599-8531, Japan
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Matsuyama Tetsuya
Department of Physics and Electronics, Faculty of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Sakai 599-8531, Japan
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Kato Toshihiro
Optoelectronic Device Development Group, New Business Development Center, Daido Steel Co. Ltd., 2-30 Daido-cho, Minami-ku, Nagoya 457-8545, Japan
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Saka Takashi
Department of Electrical and Electronic Engineering, Daido Institute of Technology, 10-3 Takiharu-cho, Minami-ku, Nagoya 457-8530, Japan
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Iseki Maki
Department of Electrical and Electronic Engineering, Daido Institute of Technology, 10-3 Takiharu-cho, Minami-ku, Nagoya 457-8530, Japan
著作論文
- Crystalline Structure of Heteroepitaxial GaAs and GaAsP Layers Grown on GaAs Substrates Investigated by X-ray Diffraction : II. Strain in GaAsP Layer
- Crystalline Structure of Heteroepitaxial GaAs and GaAsP Layers Grown on GaAs Substrates Investigated by X-ray Diffraction : I. Mosaic Structure
- Crystalline Structure of Heteroepitaxial GaAs and GaAsP Layers Grown on GaAs Substrates Investigated by X-ray Diffraction: II. Strain in GaAsP Layer
- Crystalline Structure of Heteroepitaxial GaAs and GaAsP Layers Grown on GaAs Substrates Investigated by X-ray Diffraction: I. Mosaic Structure