TAKEUCHI Hiroshi | Central Research Lab., Hitachi, Lid.
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概要
Central Research Lab., Hitachi, Lid. | 論文
- Simultaneous Measurement of Size and Depth of Each Defect in a Silicon Wafer Using Light Scattering at Two Wavelengths : Principle, Limitation and Applications of Optical Shallow Defect Analyzer
- Excellence of Gate Oxide Integrity in Metal-Oxide-Semiconductor Large-Scale-Integrated Circuits Based on P^-/P^- Thin-Film Epitaxial Silicon Wafers
- Studies on Particle Separation by Acoustic Radiation Force and Electrostatie Force
- Highly Efficient Gettering of Heavy Metals Using Carbon Implanted Eptaxial Si Wafers
- A New Method for Measurement of Micro-Defects near the Surface of Si Wafers : Optical Shallow Defect Analyzer (OSDA)