Ishida Takeshi | Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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- Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japanの論文著者
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan | 論文
- InAsSb Quantum Dots Grown on GaAs Substrates by Molecular Beam Epitaxy
- Phase Change Nanodroplets and Microbubbles Generated from Them as Sources of Chemically Active Cavitation
- Investigation and Integration of Polycrystalline Silicon/TiN/SiON Gate Stack in Silicon on Thin Buried Oxide Complementary Metal Oxide Semiconductor Field Effect Transistors
- Inversion Electron Mobility Affected by Phase Separation in High-Permittivity Gate Dielectrics
- Increased Hole Mobility of p-GaSb/GaAs Short-Period Superlattices Grown on InP Substrates