Nakata Yoshihiro | Fujitsu Laboratories Ltd., Atsugi, Kanagawa 243-0197, Japan
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概要
Fujitsu Laboratories Ltd., Atsugi, Kanagawa 243-0197, Japan | 論文
- Effect of Oxygen Annealing on Ferroelectricity of BiFeO3 Thin Films Formed by Pulsed Laser Deposition
- Diffusion Resistance of Low Temperature Chemical Vapor Deposition Dielectrics for Multiple Through Silicon Vias on Bumpless Wafer-on-Wafer Technology
- Novel Through Silicon Vias Leakage Current Evaluation Using Infrared-Optical Beam Irradiation
- Characterization of Local Strain around Through-Silicon Via Interconnects by Using X-ray Microdiffraction
- Mn2O3 Slurry Reuse by Circulation Achieving High Constant Removal Rate