Tanase T. | Central Research Institute, Mitsubishi Materials Corporation
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概要
Central Research Institute, Mitsubishi Materials Corporation | 論文
- Light Scattering by Submicron Particles on Film-Coated Wafers
- Radial Distribution of Oxygen Precipitates in Czochralski Silicon Single Crystals
- Effect of Interstitial Oxygen on Formation of Amorphous SiO_x Layer in Directly Bonded Czoehralski Silicon Wafers
- A Study of Defect Formation Mechamism at Edges of Local Oxidation of Silicon Structure
- Metal Impurity Trapping Effect by Stress at Edges of Local Oxidation of Silicon Structure