Nishikawa Satoshi | Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
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Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd., | 論文
- Effect of Gate Materials on Generation of Interface State by Hot-Carrier Injection
- Optimum Electrode Materials for Ta_2O_5 Capacitors for High- and Low-Temperature Processes
- Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
- Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
- Effect of W Film Stress on W-Gate MOS Characteristics