OHIWA Tokuhisa | Microelectronics Engineering Laboratory, Toshiba Corporation Semiconductor Company
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概要
Microelectronics Engineering Laboratory, Toshiba Corporation Semiconductor Company | 論文
- Inspection of Critical Dimension and Transmission Uniformity of Contact Patterns by Deep UV Imaging and Regression Algorithm
- Influence of Reactive Ion Etching Applied to Si Substrate on Epitaxial Si Growth and Its Removal
- New Guidelines of Optimizing SALICIDE Structure for High Speed CMOS LSI
- Improved Ti SALICIDE Technology Using High Dose Ge Pre-Amorphization for 0.10um CMOS and Beyond
- Enhanced Recovery from Back-End Process Damage by Conductive Perovskite Electrode for BST Capacitor