Inspection of Critical Dimension and Transmission Uniformity of Contact Patterns by Deep UV Imaging and Regression Algorithm
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-12-30
著者
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YAMASHITA Kyoji
Advanced LSI Technology Laboratory, Corporate Research & Development Center Toshiba Corporation
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Yamashita K
Graduate School Of Engineering Science Osaka University
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YAMAGUCHI Shinji
Microelectronics Engineering Laboratory, Toshiba Corporation Semiconductor Company
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Yamashita Kyoji
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Yamaguchi Shinji
Microelectronics Engineering Laboratory Toshiba Corporation Semiconductor Company
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- Low-temperature Crystallization of Metal Organic Decomposition BaTiO_3 Thin Film by Hydrothermal Annealing
- Inspection of Critical Dimension and Transmission Uniformity of Contact Patterns by Deep UV Imaging and Regression Algorithm