A New Inspection Method for Phase-Shift Mask (PSM) on Deep-UV Inspection Light Source
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-06-30
著者
-
Tabata Mitsuo
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
-
Sugihara Shinji
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
-
ISOMURA Ikunao
Advanced LSI Technology Laboratory, Corporate Research & Development Center Toshiba Corporation
-
TSUCHIYA Hideo
Advanced LSI Technology Laboratory, Corporate Research & Development Center Toshiba Corporation
-
YAMASHITA Kyoji
Advanced LSI Technology Laboratory, Corporate Research & Development Center Toshiba Corporation
-
Tsuchiya Hideo
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
-
Isomura Ikunao
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
-
Yamashita Kyoji
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
-
YAMASHITA Kyoji
Advanced LSI Technology Laboratory, Corporate Research & Development Center Toshiba Corporation
関連論文
- A New Inspection Method for Phase-Shift Mask (PSM) on Deep-UV Inspection Light Source
- Inspection of Critical Dimension and Transmission Uniformity of Contact Patterns by Deep UV Imaging and Regression Algorithm