Tanaka Masamoto | Advanced Technology Research Laboratories, Nippon Steel Corp.
スポンサーリンク
概要
Advanced Technology Research Laboratories, Nippon Steel Corp. | 論文
- Surface Particle Analysis of SIMOX (Separation by IMplanted OXygen) Wafers
- Measurement of Carrier Concentration at the GaAs-Si Interface in GaAs on Si by Raman Scattering
- Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose Separation by Implanted Oxygen (SIMOX) Substrates Fabricated by Internal Thermal Oxidation (ITOX) Process
- Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose SIMOX Structures
- Evaluation of Fixed Charge and Interface Trap Densities in SIMOX Wafers and Their Effects on Device Characteristics