ONO Haruhiko | Microelectronics Research Laboratories, NEC Corporation
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概要
Microelectronics Research Laboratories, NEC Corporation | 論文
- Optimally Stable Electron Cyclotron Resonance Plasma Generation and Essential Points for Compact Plasma Source
- Time Variation of Plasma Properties in a Pulse-Time-Modulated Electron Cyclotron Resonance Discharge of Chlorine Gas
- Effects of Discharge Frequency on the Ion-Current Density and Etching Characteristics in High-Density Cl_2 Plasmas
- Ultrahigh-Vacuum Electron Cyclotron Resonance-Plasma Chemical-Vapor-Deposited SiN_x Films for X-Ray Lithography Mask Membrane : As-Deposited Properties and Radiation Stability
- Sub-Micron Pattern Control Technology for Variable-Shaped EB Lithography : A-5: PROCESS TECHNOLOGY