Li Chaoyang | Institute for Nanotechnology, Kochi University of Technology, Kami, Kochi 782-8502, Japan
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概要
- Li Chaoyangの詳細を見る
- 同名の論文著者
- Institute for Nanotechnology, Kochi University of Technology, Kami, Kochi 782-8502, Japanの論文著者
関連著者
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Kawaharamura Toshiyuki
Institute for Nanotechnology, Kochi University of Technology, Kami, Kochi 782-8502, Japan
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Li Chaoyang
Institute for Nanotechnology, Kochi University of Technology, Kami, Kochi 782-8502, Japan
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Fujita Shizuo
Photonics And Electronics Science And Engineering Center Kyoto University
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Furuta Mamoru
Institute for Nanotechnology, Kochi University of Technology, Kami, Kochi 782-8502, Japan
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Shimakawa Shin-ichi
Institute for Nanotechnology, Kochi University of Technology, Kami, Kochi 782-8502, Japan
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Hirao Takashi
Institute for Nanotechnology, Kochi University of Technology, Kami, Kochi 782-8502, Japan
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Wang Dapeng
Institute for Nanotechnology, Kochi University of Technology, Kami, Kochi 782-8502, Japan
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Kamada Yudai
Photonics And Electronics Sci. And Engineering Center Kyoto Univ. Rohm Plaza Katsura Nishikyo-ku Kyo
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Fujita Shizuo
Graduate School of Engineering, Kyoto University, Katsura, Nishikyo-ku, Kyoto 615-8520, Japan
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Wang Dapeng
Institute Of Radiation Medicine Chinese Academy Of Medical Sciences And Peking Union Medical College
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Katori Shigetaka
Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, Japan
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Piao Jinchun
Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, Japan
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Kimura Mutsumi
Department of Chemistry, Graduate School of Natural Science and Technology, Okayama University
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Kimura Mutsumi
Department of Electronics and Informatics, Ryukoku University, Otsu 520-2194, Japan
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Kamada Yudai
Graduated School of Engineering, Kyoto University, Kyoto 615-8520, Japan
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Fujita Shizuo
Photonics and Electronics Science and Engineering Center, Kyoto University, Kyoto 615-8520, Japan
著作論文
- Photo-Leakage Current of Thin-Film Transistors with ZnO Channels Formed at Various Oxygen Partial Pressures under Visible Light Irradiation (Special Issue : Active-Matrix Flatpanel Displays and Devices : TFT Technologies and FPD Materials)
- Photocurrent and Persistent Photoconductivity in Zinc Oxide Thin-Film Transistors under Ultraviolet-Light Irradiation
- Fabrication of Silicon Oxide Thin Films by Mist Chemical Vapor Deposition Method from Polysilazane and Ozone as Sources