Ueki Makoto | LSI Fundamental Research Lab., NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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概要
- Ueki Makotoの詳細を見る
- 同名の論文著者
- LSI Fundamental Research Lab., NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japanの論文著者
関連著者
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林 喜宏
NECシステムデバイス研究所
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林 喜宏
日本電気株式会社デバイスプラットフォーム研究所
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林 喜宏
日本電気株式会社マイクロエレクトロニクス研究所 超高集積回路研究部
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HAYASHI Yoshihiro
Device Platforms Research Labs., NEC.
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Hayashi Yoshihiro
Nec Corporation
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Ueki Makoto
LSI Fundamental Research Lab., NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Hayashi Yoshihiro
LSI Fundamental Research Laboratory, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Hayashi Yoshihiro
System Devices Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Hayashi Yoshihiro
System Devices Research Laboratories, NEC, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Hayashi Yoshihiro
System Devices and Fundamental Research, NEC Corporation, 1120, Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Hayashi Yoshihiro
Microelectronics Research Laboratories, NEC, 1120, Shimokuzawa, Sagamihara, Kanagawa 229, Japan
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Hayashi Yoshihiro
LSI Fundamental Research Lab., NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Okada Norio
Advanced Technology Center National Astronomical Observatory
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Fukai Toshinori
Advanced Device Development Division Nec Electronics Corporation
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Inoue Naoya
LSI Fundamental Research Laboratory, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Ueki Makoto
LSI Fundamental Research Laboratory, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Tada Munehiro
Device Platforms Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Kawahara Jun
LSI Fundamental Research Laboratory, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Yamamoto Hironori
LSI Fundamental Research Laboratory, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Ito Fuminori
LSI Fundamental Research Laboratory, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Miyake Shinichi
Advanced Devices Division, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Takeuchi Tsuneo
LSI Fundamental Research Laboratory, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Saito Shinobu
LSI Fundamental Research Laboratory, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Tagami Masayoshi
LSI Fundamental Research Laboratory, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Furutake Naoya
LSI Fundamental Research Laboratory, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Hijioka Kenichiro
LSI Fundamental Research Laboratory, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Ito Takatoshi
Advanced ASIC Division, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Shibue Yasuo
Advanced ASIC Division, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Senou Takefumi
Advanced ASIC Division, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Ikeda Rikikazu
Advanced ASIC Division, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Onodera Takahiro
LSI Fundamental Research Lab., NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Fukai Toshinori
Advanced Devices Division, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Hoshino Susumu
Core Technology Center, Nikon Corporation, 1-6-3 Nishiohi, Shinagawa, Tokyo 140-8601, Japan
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Okada Norio
Advanced Devices Division, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Ishikawa Akira
Core Technology Center, Nikon Corporation, 1-6-3 Nishiohi, Shinagawa, Tokyo 140-8601, Japan
著作論文
- Porous Low-$k$ Impacts on Performance of Advanced LSI Devices with GHz Operations
- Defectless Monolithic Low-$k$/Cu Interconnects Produced by Chemically Controlled Chemical Mechanical Polishing Process with In situ End-Point-Detection Technique