NODA Shuichi | Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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概要
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd. | 論文
- Broad-Band Second-Harmonic Generation in LiNbO_3 Waveguide Using Optimized Domain-Inverted Grating
- Modeling of Mechanism of Leakage in a Shallow p^+/n Junction Formed by Preamorphization
- Optimization of the Amorphous Layer Thickness and the Junction Depth in the Preamorphization Method for Shallow-Junction Formation
- Thermal Stability of Interconnect of TiN/Cu/TiN Multilayered Structure
- A New Mechanism of Failure in Silicon p^+/n Junction Induced by Diffusion Barrier Metals