Kim Tea | Inha University, 253 Yonghyun-dong, Nam-gu, Incheon 402-751, Korea
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概要
関連著者
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Kim Tea
Inha University, 253 Yonghyun-dong, Nam-gu, Incheon 402-751, Korea
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Choi Rino
Inha University, 253 Yonghyun-dong, Nam-gu, Incheon 402-751, Korea
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Jeong Jae
Inha University, 253 Yonghyun-dong, Nam-gu, Incheon 402-751, Korea
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Jang Tae-Young
Inha University, 253 Yonghyun-dong, Nam-gu, Incheon 402-751, Korea
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Kim Dong-Hyoub
Inha University, 253 Yonghyun-dong, Nam-gu, Incheon 402-751, Korea
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Kim Jung-Woo
Inha University, 253 Yonghyun-dong, Nam-gu, Incheon 402-751, Korea
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Lee Byoung
Gwangju Institute of Science and Technology, 1 Oryong-dong, Buk-gu, Gwangju 500-712, Korea
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Park Hokyung
SEMATECH, 2706 Montopolis Drive, Austin, TX 78741, U.S.A.
著作論文
- Effect of Trap Profile on Device Characteristics of Metal–Oxide–Semiconductor Field Effect Transistors with Hafnium-Based Dielectrics
- Dominant Device Instability Mechanism in Scaled Metal–Oxide–Semiconductor Field-Effect Transistors with Hafnium Oxide Dielectric