Kim Ju | Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
スポンサーリンク
概要
- 同名の論文著者
- Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Koreaの論文著者
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea | 論文
- TiN Diffusion Barrier Grown by Atomic Layer Deposition Method for Cu Metallizaiton
- Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)_2] and Dicobalt Octacarbonyl [Co_2(CO)_8]
- Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
- Characteristics of Cobalt Films Deposited by Metal Organic Chemical Vapor Deposition Method Using Dicobalt Hexacarbonyl tert-Butylacetylene
- Effects of Strained Silicon Layer on Nickel (Germano)silicide for Nanoscale Complementary Metal Oxide Semiconductor Field-Effect Transistor Device