Inoue Hirotada | New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
スポンサーリンク
概要
- Inoue Hirotadaの詳細を見る
- 同名の論文著者
- New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japanの論文著者
関連著者
-
Hirayama Masaki
New Industry Creation Hatchery Center Tohoku University
-
Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
-
TANAKA Kouji
New Industry Creation Hatchery Center, Tohoku University
-
Inoue Hirotada
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
-
Aharoni Herzl
New Industry Creation Hatchery Center Tohoku University
-
Takeda Toru
New Industry Creation Hatchery Center Tohoku University
-
Tsumori Toshirou
New Industry Creation Hatchery Center Tohoku University
-
Teramoto Akinobu
New Industry Creation Hatchery Center (NICHe), Tohoku University, Sendai 980-8579, Japan
-
Hirayama Masaki
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
-
Inoue Hirotada
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
-
Sano Yuichi
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
-
Nishimura Takehiro
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
-
Tanaka Kouji
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
-
Takeda Toru
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
-
Aharoni Herzl
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
著作論文
- High-Rate Deposition of Amorphous Silicon Films by Microwave-Excited High-Density Plasma
- Microcrystalline/Amorphous Thin Si Films Deposition by a Newly Developed Dual Injection System Employing Hydrogen Plasma and Silicon Radicals at Low Temperature (300 °C) Chemical Vapor Deposition Process