Takeda Toru | New Industry Creation Hatchery Center Tohoku University
スポンサーリンク
概要
関連著者
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Aharoni Herzl
New Industry Creation Hatchery Center Tohoku University
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Ohmi Tadahiro
New Industry Creation Hatchery Center (niche) Tohoku University
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Takeda Toru
New Industry Creation Hatchery Center Tohoku University
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TANAKA Kouji
New Industry Creation Hatchery Center, Tohoku University
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Tsumori Toshirou
New Industry Creation Hatchery Center Tohoku University
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AHARONI Herzl
New Industry Creation Hatchery Center, Tohoku University
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Hirayama Masaki
New Industry Creation Hatchery Center Tohoku University
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Saito Masaki
New Industry Creation Hatchery Center Tohoku University
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KATO Yoshimichi
New Industry Creation Hatchery Center, Tohoku University
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TSUMORI Toshirou
New Industry Creation Hatchery Center, Tohoku University
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Kato Yoshimichi
New Industry Creation Hatchery Center Tohoku University
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Hirayama Masaki
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Inoue Hirotada
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Takeda Toru
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Aharoni Herzl
New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
著作論文
- Low temperature (300℃) growth of crystalline/non-crystalline thin Si films by a newly developed single shower dual injection system employing microwave excited high density hydrogen plasma and silicon radicals CVD process
- Microcrystalline/Amorphous Thin Si Films Deposition by a Newly Developed Dual Injection System Employing Hydrogen Plasma and Silicon Radicals at Low Temperature (300 °C) Chemical Vapor Deposition Process