Hsia Harry | Taiwan Semiconductor Manufacturing Company, 8 Li-Hsin Rd 6, Hsinchu Science Park, Hsinchu 300, Taiwan

スポンサーリンク

概要

関連著者

Fang Yean-kuen
Institute Of Microelectronics National Cheng Kung University
HSIEH Jang-Cheng
Taiwan Memory Technology Inc.
SHEU Yi-Ming
Taiwan Semiconductor Manufacturing Company
Hsieh Jang-Cheng
Taiwan Semiconductor Manufacturing Company, 8 Li-Hsin Rd 6, Hsinchu Science Park, Hsinchu 300, Taiwan
Cheng Chung-Yun
Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, No. 1 University Road, Tainan 701, Taiwan
Hsia Harry
Taiwan Semiconductor Manufacturing Company, 8 Li-Hsin Rd 6, Hsinchu Science Park, Hsinchu 300, Taiwan
Chen Wei-Ming
Taiwan Semiconductor Manufacturing Company, 8 Li-Hsin Rd 6, Hsinchu Science Park, Hsinchu 300, Taiwan
Lin Shyue-Shyh
Taiwan Semiconductor Manufacturing Company, 8 Li-Hsin Rd 6, Hsinchu Science Park, Hsinchu 300, Taiwan
Hou Chin-Shan
Taiwan Semiconductor Manufacturing Company, 8 Li-Hsin Rd 6, Hsinchu Science Park, Hsinchu 300, Taiwan
Sheu Yi-Ming
Taiwan Semiconductor Manufacturing Company, 8 Li-Hsin Rd 6, Hsinchu Science Park, Hsinchu 300, Taiwan
Fang Yean-Kuen
Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, No. 1 University Road, Tainan 701, Taiwan

もっと見る

著作論文

Narrow Width and Length Dependence of SiGe and Sallow-Trench-Isolation Stress Induced Defects in 45 nm p-Type Metal–Oxide–Semiconductor Field-Effect Transistors with Strained SiGe Source/Drain

スポンサーリンク