MITANI Y. | R&D Center, Toshiba Corporation

スポンサーリンク

概要

• 同名の論文著者
• R&D Center, Toshiba Corporationの論文著者

関連著者

• Mitani Y.

  R&d Center Toshiba Corporation

• MIZUSHIMA I.

  Microelectronics Engineering Laboratory, Toshiba Corporation

• MITANI Y.

  R&D Center, Toshiba Corporation

• KAMBAYASHI S.

  R&D Center, Toshiba Corporation

• Kambayashi S.

  R&d Center Toshiba Corporation

• Mizushima I.

  Microelectronics Engineering Laboratory Toshiba Corporation

• MIYANO K.

  Microelectronics Engineering Laboratory, Toshiba Corporation

• KOIKE M.

  R&D Center, Toshiba Corporation

• YOSHIKI M.

  R&D Center, Toshiba Corporation

• TOMITA M.

  R&D Center, Toshiba Corporation

• Miyano K.

  Microelectronics Engineering Laboratory Toshiba Corporation

もっと見る 閉じる

著作論文

• Oxide Mediated Solid Phase Epitaxy (OMSPE) of Silicon : A New Low Temperature Epitaxy Technique Using Intentionally Grown Native Oxide
• Deactivation of Boron in Highly Boron-Doped Silicon

スポンサーリンク