YOSHIKI M. | R&D Center, Toshiba Corporation

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概要

• 同名の論文著者
• R&D Center, Toshiba Corporationの論文著者

関連著者

• Mitani Y.

  R&d Center Toshiba Corporation

• MIZUSHIMA I.

  Microelectronics Engineering Laboratory, Toshiba Corporation

• KAMBAYASHI S.

  R&D Center, Toshiba Corporation

• YOSHIKI M.

  R&D Center, Toshiba Corporation

• Kambayashi S.

  R&d Center Toshiba Corporation

• Mizushima I.

  Microelectronics Engineering Laboratory Toshiba Corporation

• MITANI Y.

  R&D Center, Toshiba Corporation

• KOIKE M.

  R&D Center, Toshiba Corporation

• TOMITA M.

  R&D Center, Toshiba Corporation

• KAMIYA H.

  Microelectronics Engineering Laboratory, Toshiba Corporation

• ARAI N.

  Toshiba Microelectronics Corporation

• SONODA M.

  Semiconductor Manufacturing Engineering Center, Toshiba Corporation

• TAKAGI S.

  R&D Center, Toshiba Corporation

• WAKAMIYA M.

  Semiconductor Manufacturing Engineering Center, Toshiba Corporation

• MIKATA Y.

  Semiconductor Manufacturing Engineering Center, Toshiba Corporation

• MORI S.

  Microelectronics Engineering Laboratory, Toshiba Corporation

• KASHIWAGI M.

  R&D Center, Toshiba Corporation

• Wakamiya M.

  Semiconductor Manufacturing Engineering Center Toshiba Corporation

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著作論文

• Deactivation of Boron in Highly Boron-Doped Silicon
• Diffusion of Carbon in SiO_2 Films and Its Segregation at Si/SiO_2 Interface

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