Ishihara Ryoichi | Laboratory Of Electronic Components And Materials (ectm) Delft Institute Of Microelectronics And Sub

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• ISHIHARA Ryoichiの詳細を見る
• 同名の論文著者
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Laboratory Of Electronic Components And Materials (ectm) Delft Institute Of Microelectronics And Sub | 論文

• Location Control of Large Grain Following Excimer-Laser Melting of Si Thin-Films
• Location Control of Crystal Si Grain Followed by Excimer-Laser Melting of Si Thin-Films
• Location-Control of Large Si Grains by Dual-Beam Excimer-Laser and Thick Oxide Portion
• Location Control of Large Grain Following Excimer-Laser Melting of Si Thin-Films
• Large Polycrystalline Silicon Grains Prepared by Excimer Laser Crystallization of Sputtered Amorphous Silicon Film with Process Temperature at 100 °C

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