Miyajima H | Seiko Epson Corp. Nagano Jpn

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概要

• MIYAJIMA Hideshiの詳細を見る
• 同名の論文著者
• Seiko Epson Corp. Nagano Jpnの論文著者

関連著者

• Katsumata R

  Toshiba Corp. Kawasaki Jpn

• Katsumata Ryota

  Advanced Semiconductor Devices Research Labs. R&d Center Toshiba Corp.

• MIYAJIMA Hideshi

  Microelectronics Engineering Lab., Toshiba Corp.

• HAYASAKA Nobuo

  Microelectronics Engineering Lab., Toshiba Corp.

• Hayasaka N

  Microelectronics Engineering Lab. Toshiba Corp.

• Nakasaki Y

  Advanced Semiconductor Devices Research Labs. R&d Center Toshiba Corp.

• Miyajima H

  Seiko Epson Corp. Nagano Jpn

• NAKASAKI Yasushi

  ULSI Research Labs., R & D Center, Toshiba Corp.

• KATSUMATA Ryota

  ULSI Research Labs., R & D Center, Toshiba Corp.

• Katsumata Ryota

  ULSI Research Labs. R & D Center, Toshiba Corp.

• Nakasaki Yasushi

  ULSI Research Labs. R & D Center, Toshiba Corp.

• HAYASAKA Nobuo

  ULSI Research Center, Toshiba Corp.

• MIYAJIMA Hideshi

  ULSI Research Laboratories, Research & Development Center, Toshiba Corporation

• Hayasaka Nobuo

  Ulsi Research Center Toshiba Corp.

• Nishiyama Yukio

  Faculty Of Engineering Hiroshima University

• Nishiyama Yukio

  Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba

• NAKASAKI Yasushi

  Advanced Semiconductor Devices Research Labs., R&D Center, Toshiba Corp.

• NISHIYAMA Yukio

  ULSI Research Laboratories, Research & Development Center, Toshiba Corporation

• Nishiyama Yukio

  Ulsi Research Laboratories Research & Development Center Toshiba Corporation:(present Address) Integrated Circuit Advanced Process Engineering Department Toshiba Corporation

• Nakasaki Yasushi

  Advanced Semiconductor Devices Research Labs., R&D Center, Toshiba Corp.

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著作論文

• Ab Initio Molecular Orbital Study of Suppression of Water Absorption and Hydrolysis(F-Removal)of Chemical-Vapor-Deposited SiOF Films by Nitrogen Doping
• Ab initio Molecular Orbital Study of Water Absorption and Hydrolysis of Chemical Vapor Deposited SiOF Films II
• Ab initio Molecular Orbital Study of Water Absorption and Hydrolysis of Chemical Vapor Deposited SiOF Films I
• Water Absorption Properties of Fluorine-Doped SiO_2 Films Using Plasma-Enhanced Chemical Vapor Deposition
• Fluorine Doped SiO_2 for Low Dielectric Constant Films in Sub-Half Micron ULSI Multilevel Interconnection

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