Matsuyama Seiji | Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co.
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- Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co. の論文著者
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electric Industrial Co. | 論文
- A Highly Reliable MIM Technology with non-Crystallized HfOx Dielectrics Using Novel MOCVD Stacked TiN Bottom Electrodes
- Metal-Organic Chemical Vapor Deposition of HfO_2 by Alternating Supply of Tetrakis-Diethylamino-Hafnium and Remote-Plasma Oxygen
- Contact Hole Etch Scaling toward 0.1 μm
- Spatial and Temporal Behavior of Radicals in Inductively Coupled Plasm for SiO_2 Etching
- Highly Selective SiO2 Etching Using Inductively Coupled Plasma Source with a Multispiral Coil