Tsuruoka T | The Authors Are With R & D Department Components Division Oki Electric Industry Co. Ltd.
スポンサーリンク
概要
- TSURUOKA Taijiの詳細を見る
- 同名の論文著者
- The Authors Are With R & D Department Components Division Oki Electric Industry Co. Ltd.の論文著者
関連著者
-
Tsuruoka T
The Authors Are With R & D Department Components Division Oki Electric Industry Co. Ltd.
-
Kakinuma Hiroaki
The Devices Technology Laboratory Oki Electric Industry Co. Ltd.
-
Kakinuma Hiroaki
Research Laboratory Oki Electric Industry Co. Ltd.
-
Mohri M
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
-
Kakinuma Hiroaki
Research Laboratory Oki Electric Industry Co. Lid.
-
Tsuruoka Taiji
Research And Development Division Oki Electric Ind. Co. Ltd.
-
Mohri Mikio
Research Laboratory, Oki Electric Industry Co., Ltd.
-
Okayama Hideaki
The Authors Are With R & D Department Components Division Oki Electric Industry Co. Ltd.
-
Arai T
Department Of Physical Electronics Tokyo Institute Of Technology
-
ARAI Toru
The authors are with R & D Department, Components Division, Oki Electric Industry Co., Ltd.
-
TSURUOKA Taiji
The authors are with R & D Department, Components Division, Oki Electric Industry Co., Ltd.
-
Mohri Mikio
the Devices Technology Laboratory, OKI Electric Industry Co., Ltd.,
-
Tsuruoka Taiji
the Devices Technology Laboratory, OKI Electric Industry Co., Ltd.,
-
KAKINUMA Hiroaki
The Department of Pediatrics, Shimoshizu National Hospital Yotsukaido
著作論文
- Arrayed 1 × N Switch for Wavelength Routing(Special Issue on Advanced Optical Devices for Next Generation Photonic Networks)
- Effect of SiF_4/SiH_4/H_2 Flow Rates on Film Properties of Low-Temperature Polycrystalline Silicon Films Prepared by Plasma Enhanced Chemical Vapor Deposition
- Phosphorus Doping Using Electron Cyclotrorn Resonance Plasma for Large-Area Polycrystalline Silicon Thin Film Transistors
- Phosphine Doping Effects in the Plasma Deposition of Polycrystalline Silicon Films