Kitano Hiroshi | Core Technology Center Nikon Corporation
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概要
関連著者
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Kitano Hiroshi
Core Technology Center Nikon Corporation
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Owa Soichi
Core Technology Center Nikon Corporation
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Matsumura Hiroyoshi
SOSHO Project (Crystal Design Project), Osaka University
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Inoue Tsuyoshi
SOSHO Project (Crystal Design Project), Osaka University
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Mori Yusuke
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Adachi Hiroaki
Department Of Biological Science Faculty Of Science Hiroshima University
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Sasaki Takatomo
Department Of Electrical Electronic And Information Engineering Osaka University
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Takano Kazufumi
SOSHO Project (Crystal Design Project), Osaka University
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KITANO Hiroshi
Core Technology Center, Nikon Corporation
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Doi Masaaki
Core Technology Center Nikon Corporation
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OWA Soichi
Core Technology Center, Nikon Corporation
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Kawai Hitoshi
Core Technology Center Nikon Corporation
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Muramatsu Ken-ichi
Core Technology Center Nikon Corporation
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Mori Yusuke
Graduate School Of Bionics Tokyo University Of Technology
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Murakami Atsutoshi
Department of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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YOSHIMURA Masashi
Graduate school of Electrical Engineering, Osaka University
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SASAKI Takatomo
Graduate school of Electrical Engineering, Osaka University
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Owa Soichi
Core Technology Center, Nikon Corporation, 1-6-3 Nishi-Ohi, Shinagawa-ku, Tokyo 140-8601, Japan
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DOI Masaaki
Core Technology Center, Nikon Corporation
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Mori Yusuke
Graduate School of Engineering, Osaka University
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Koga Yuichi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Takeuchi Kengo
Department Of Laboratory Medicine Research Hospital The Institute Of Medical Science The University
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Sasaki Takatomo
Graduate School Of Engineering Osaka University
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Mori Y
Department Of Electrical Engineering Osaka University
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Takano Kazufumi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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KAWAI Hitoshi
Core Technology Center, Nikon Corporation
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MURAMATSU Ken-ichi
Core Technology Center, Nikon Corporation
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YOSHIMURA Masashi
Graduate School of Engineering, Osaka University
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TOKUHISA Akira
Core Technology Center, Nikon Corporation
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Yoshimura Masashi
Graduate School Of Engineering Osaka University
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Mori Yusuke
Graduate School Of Engineering Osaka University
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Tokuhisa Akira
Core Technology Center Nikon Corporation
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Sasaki Takatomo
Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Kanaya Shigenori
Department of Material and Life Science, Graduate School of Engineering, Osaka University
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Murakami Satoshi
SOSHO Inc., Osaka 541-0053, Japan
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Adachi Hiroaki
Department of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Inoue Tsuyoshi
SOSHO Project (Crystal Design Project), Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Takano Kazufumi
Department of Material and Life Science, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Koga Yuichi
Department of Material and Life Science, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Takeuchi Kengo
Department of Material and Life Science, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Kawai Hitoshi
Core Technology Center, Nikon Corporation, 1-6-3 Nishi-Ohi, Shinagawa-ku, Tokyo 140-8601, Japan
著作論文
- 387-nm Generation in Gd_xY_Ca_4O(BO_3)_3 Crystal and Its Utilization for 193-nm Light Source
- Measurements of the Nonlinear Refractive Index of an Er^-Doped Bi_2O_3-Based Glass Fiber : Optics and Quantum Electronics
- Protein Crystal Growth Using Laser-Processed Seed Crystals
- New Approach to Improve X-Ray Diffraction Pattern of Protein Crystal Using UV-Laser Ablative Processing
- Protein Crystal Processing Using a Deep-UV Laser
- 387-nm Generation in GdxY1-xCa4O(BO3)3 Crystal and Its Utilization for 193-nm Light Source