Owa Soichi | Core Technology Center, Nikon Corporation, 1-6-3 Nishi-Ohi, Shinagawa-ku, Tokyo 140-8601, Japan

スポンサーリンク

概要

• Owa Soichiの詳細を見る
• 同名の論文著者
• Core Technology Center, Nikon Corporation, 1-6-3 Nishi-Ohi, Shinagawa-ku, Tokyo 140-8601, Japanの論文著者

関連著者

• Kitano Hiroshi

  Core Technology Center Nikon Corporation

• Owa Soichi

  Core Technology Center Nikon Corporation

• Owa Soichi

  Core Technology Center, Nikon Corporation, 1-6-3 Nishi-Ohi, Shinagawa-ku, Tokyo 140-8601, Japan

• Takano Kazufumi

  SOSHO Project (Crystal Design Project), Osaka University

• Matsumura Hiroyoshi

  SOSHO Project (Crystal Design Project), Osaka University

• Inoue Tsuyoshi

  SOSHO Project (Crystal Design Project), Osaka University

• Kawai Hitoshi

  Core Technology Center Nikon Corporation

• Muramatsu Ken-ichi

  Core Technology Center Nikon Corporation

• Mori Yusuke

  Graduate School Of Bionics Tokyo University Of Technology

• Mori Yusuke

  Department Of Applied Chemistry School Of Science And Engineering Waseda University

• Adachi Hiroaki

  Department Of Biological Science Faculty Of Science Hiroshima University

• Sasaki Takatomo

  Department Of Electrical Electronic And Information Engineering Osaka University

• Murakami Atsutoshi

  Department of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan

• YOSHIMURA Masashi

  Graduate school of Electrical Engineering, Osaka University

• SASAKI Takatomo

  Graduate school of Electrical Engineering, Osaka University

• Sasaki Takatomo

  Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan

• Adachi Hiroaki

  Department of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan

• Inoue Tsuyoshi

  SOSHO Project (Crystal Design Project), Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan

• Kawai Hitoshi

  Core Technology Center, Nikon Corporation, 1-6-3 Nishi-Ohi, Shinagawa-ku, Tokyo 140-8601, Japan

もっと見る 閉じる

著作論文

• Protein Crystal Processing Using a Deep-UV Laser
• 387-nm Generation in GdxY1-xCa4O(BO3)3 Crystal and Its Utilization for 193-nm Light Source

スポンサーリンク