KIM Chang-Il | School of Electrical & Electronic Engineering, Chung-Ang University
スポンサーリンク
概要
関連著者
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KIM Chang-Il
School of Electrical & Electronic Engineering, Chung-Ang University
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Woo Jong-Chang
School of Electrical and Electronics Engineering, Chung-Ang University, 221, Heukseuk-dong, Dongjak-gu, Seoul 156-756, Korea
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Lee Yong-eui
Electronics And Telecommunications Research Institute
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KWON Kwang-Ho
Department of Electronic Engineering, Hanseo Unviersity
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Kwon Kwang-ho
Department Of Electronic Engineering Hanseo University
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YUN Sun
Electronics and Telecommunications Research Institute
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Yun Sun
Electronic and Telecommunications Research Institute, Daejon 305-350, Korea
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Kim Chang-Il
School of Electrical & Electronic Engineering, Chung-Ang University, 221 Huksuk-Dong, Dongjak-Gu, Seoul 156-756, Korea
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Um Doo-Seung
School of Electrical and Electronics Engineering, Chung-Ang University, 221, Heukseuk-dong, Dongjak-gu, Seoul 156-756, Korea
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Lee Yong-Eui
Electronics and Telecommunications Research Institute, 161 Gajung-dong, Yusong-gu, Daejon 305-350, Korea
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Kim Dong-Pyo
School of Electrical and Electronics Engineering, Chung-Ang University, 221, Heukseuk-dong, Dongjak-gu, Seoul 156-756, Korea
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KWON Kwang-Ho
Department of Control and Instrumentation Engineering, Korea University
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Kwon Kwang-Ho
Department of Electronic Engineering, Hanseo University, 360 Daegok-Ri, Haemi-Myun, Seosan-Si, Chung-Nam 356-820, Korea
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Kim Gwan-Ha
School of Electrical and Electronics Engineering, Chung-Ang University, 221, Heukseuk-dong, Dongjak-gu, Seoul 156-756, Korea
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Park Jung-Soo
School of Electrical and Electronics Engineering, Chung-Ang University, Seoul 156-759, Korea
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Joo Young-Hee
School of Electrical and Electronics Engineering, Chung-Ang University, Seoul 156-756, Korea
著作論文
- Etching Characteristics of Manganese-Doped Zinc Sulfide Film Using Cl_2/CF_4 Inductively Coupled Plasma
- Etch characterization of TiO2 thin films using metal-insulator-metal capacitor in adaptively coupled plasma (Special issue: Dry process)
- Etch properties of TiN thin film in metal-insulator-metal capacitor using inductively coupled plasma (Special issue: Dry process)
- Etch Characteristics of ZrO2 Thin Films in High Density Plasma
- Etching Characteristics of Manganese-Doped Zinc Sulfide Film Using Cl2/CF4 Inductively Coupled Plasma