Watabe Hirokuni | Matsushita Electric Industrial Co. Ltd.
スポンサーリンク
概要
関連著者
-
WATABE Hirokuni
Matsushita Research Institute Inc.
-
Watabe Hirokuni
Matsushita Electric Industrial Co. Ltd.
-
Kusaka M
Research Laboratory For Surface Science Faculty Of Science Okayama University
-
Hirai Masaaki
Research Laboratory For Surface Science Faculty Of Science Okayama University
-
IWAMI Motohiro
Research Laboratory for Surface Science, Faculty of Science, Okayama University
-
KUSAKA Masahiko
Research Laboratory for Surface Science, Faculty of Science, Okayama University
-
Kawai M
Surface Chemistry Laboratory
-
Iwami Motohiro
Reseach Laboratory For Surface Science Faculty Of Science Okayama University
-
Iwami M
Department Of Physics Faculty Of Science Hiroshima University
-
Kusaka Masahiko
Research Laboratory For Surface Science Faculty Of Science Okayama University
-
Iwami M
Research Laboratory For Surface Science Faculty Of Science Okayama University
-
中村 裕之
Graduate School Of Material Science University Of Hyogo
-
Hirai M
Research Laboratory For Surface Science Faculty Of Science Okayama University
-
Nakamura H
Institute For Protein Research Osaka University
-
NAKAMURA Hatsuo
Osaka Electro-Communication University
-
Hirai M
Osaka Univ. Osaka Jpn
-
Hirai Masamitsu
Department Of Applied Physics Faculty Of Engineering Tohoku University
-
Yamauchi Shoichi
Research Laboratory for Surface Science, Faculty of Science, Okayama University
-
KAWAI Masao
Shimazu Co.
-
SOEZIMA Hiroyoshi
Shimazu Co.
-
Soezima H
Shimazu Co.
-
Nakamura Hatsuo
Faculty Of Engineering Osaka Electro-communication University
-
ITO Toshimichi
Department of Electrical Engineering, Faculty of Engineering, Osaka University
-
HIRAKI Akio
Department of Electrical Engineering, Faculty of Engineering, Osaka University
-
Nakamura H
Univ. Tokyo
-
Hiraki Akio
Department Of Electrical Engineering Faculty Of Engineering Osaka University
-
Kawamoto Satoshi
Research Laboratory For Surface Science Faculty Of Science Okayama University
-
Yap Yoke
Department Of Electrical Engineering Osaka University
-
YOKOTA Yasuhiro
The Research Center for Microanalysis, Okayama University of Science
-
WANG Jinliang
Research Laboratory for Surface Science, Faculty of Science, Okayama University
-
MORII Takashi
Matsushita Research Institute Inc.
-
Kasaya Megumi
Research Laboratory for Surface Science, Faculty of Science, Okayama University
-
AKIYAMA Akitsugu
Central Research Laboratories, Kuraray Co., Ltd.
-
MINOMURA Shigeru
Okayama University of Science
-
Wang J
Department Of Physics The University Of Hong Kong
-
Yokota Y
The Research Center For Microanalysis Okayama University Of Science
-
Ito Toshimichi
Department Of Electrical Engineering Osaka University
-
Ito Toshimichi
Department Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka
-
YASUMATSU Tatsuro
Department of Electrical Engineering, Osaka University
-
Yokota Y
Department Of Electrical Engineering Osaka University
-
KUBOTA Masaru
Research Laboratory for Surface Science, Faculty of Science, Okayama University
-
YAMAMOTO Sekika
Research Laboratory for Surface Science, Faculty of Science, Okayama University
-
Jinliang Wang
Research Laboratory For Surface Science Faculty Of Science Okayama University
-
Yasumatsu Tatsuro
Department Of Electrical Engineering Osaka University
-
Yokota Yasuhiro
The Research Center For Microanalysis Okayama University Of Science
-
Yamamoto Sekika
Research Laboratory For Surface Science Faculty Of Science Okayama University
-
Akiyama Akitsugu
Central Research Laboratories Kuraray Co. Ltd.
-
Kubota Masaru
Research Laboratory For Surface Science Faculty Of Science Okayama University
著作論文
- Mn (Thin-Film)/Si (Substrate) Contacts: Analysis of the Buried Interface by Soft X-Ray Emission Spectroscopy
- Valence Band Density of States of the Iron Silicides Studied by Soft X-Ray Emission Spectroscopy
- Ni-Silicide Formation : Dependence on Crystallographic Orientation of Si Substrates
- Valence Band Density of States of Palladium Silicides Studied by X-Ray Emission Spectroscopy (XES)
- Nondestructive Depth Profiling Using Soft X-Ray Emission Spectroscopy by Incident Angle Variation Method
- Soft X-Ray Spectroscopic Analysis of Ni-Silicides
- Structural Change of Crystalline Porous Silicon with Chemisorption
- Soft X-Ray Emission Spectroscopy (SXES) Study of the Valence Band Electronic Structure of a Au-Si Alloy
- Construction of a Soft X-Ray Emission Spectroscopy (SXES) Apparatus and Its Application for Study of Electronic and Atomic Structures of a Multilayer System