KITAJIMA Hiroshi | ULSI Device Development Laboratories, NEC Corporation
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概要
関連著者
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KITAJIMA Hiroshi
ULSI Device Development Laboratories, NEC Corporation
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Shiramizu Yoshimi
Ulsi Device Development Laboratories Nec Corporation
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Kitajima Hiroshi
Ulsi Device Development Laboratories Nec Corporation
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KITAJIMA Hiroshi
ULSI Device Development Division, NEC Corporation
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MATSUDA Tomoko
ULSI Device Development Division, NEC Corporation
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Matsuda T
Ulsi Device Development Division Nec Corporation:(present)yokohama Research Center Association Of Su
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YAMASAKI Shinya
ULSI Device Development Laboratories, NEC Corporation
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Yamasaki Shinya
Ulsi Device Development Laboratories Nec Corporation
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SHIRAMIZU Yoshimi
ULSI Device Development Laboratories, NEC Corporation
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TANAKA Masaru
ULSI Device Development Laboratories, NEC Corporation
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NAKAMORI Masaharu
ULSI Device Development Laboratories, NEC Corporation
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AOTO Nahomi
ULSI Device Development Laboratories, NEC Corporation
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Aoto Nahomi
Ulsi Device Development Laboratories Nec Corporation
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SHISHIGUCHI Seiichi
ULSI Device Development Division, NEC Corporation
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Nakamori Masaharu
Ulsi Device Development Laboratories Nec Corporation
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Matsuda Tomoko
Ulsi Device Development Division Nec Corporation
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Tanaka Masaru
Ulsi Device Development Laboratories Nec Corporation
著作論文
- Effect of Metals (Fe,Cu) on 8-nm-Thick Gate Oxide Reliability
- Ultra Shallow Junction Formation with High Process Controllability Using Optimized Rapid Thermal Anneal Process
- Effect of Organic Compounds on Gate Oxide Reliability