Shiramizu Yoshimi | Ulsi Device Development Laboratories Nec Corporation

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概要

• 同名の論文著者
• Ulsi Device Development Laboratories Nec Corporationの論文著者

関連著者

• Shiramizu Yoshimi

  Ulsi Device Development Laboratories Nec Corporation

• KITAJIMA Hiroshi

  ULSI Device Development Laboratories, NEC Corporation

• Kitajima Hiroshi

  Ulsi Device Development Laboratories Nec Corporation

• ISHITANI Akihiko

  ULSI Device Development Laboratories, NEC Corporation

• YAMASAKI Shinya

  ULSI Device Development Laboratories, NEC Corporation

• Yamasaki Shinya

  Ulsi Device Development Laboratories Nec Corporation

• SHIRAMIZU Yoshimi

  ULSI Device Development Laboratories, NEC Corporation

• TANAKA Masaru

  ULSI Device Development Laboratories, NEC Corporation

• NAKAMORI Masaharu

  ULSI Device Development Laboratories, NEC Corporation

• AOTO Nahomi

  ULSI Device Development Laboratories, NEC Corporation

• Aoto Nahomi

  Ulsi Device Development Laboratories Nec Corporation

• Ishitani Akihiko

  Ulsi Device Development Laboratories Nec Corporation

• Nakamori Masaharu

  Ulsi Device Development Laboratories Nec Corporation

• Morita Makoto

  ULSI Device Development Laboratories, NEC Corporation

• Morita Makoto

  Ulsi Device Development Laboratories Nec Corporation

• Tanaka Masaru

  Ulsi Device Development Laboratories Nec Corporation

• KITAJIMA Hiroshi

  ULSI Device Development Division, NEC Corporation

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著作論文

• Effect of Metals (Fe,Cu) on 8-nm-Thick Gate Oxide Reliability
• Effect of Organic Compounds on Gate Oxide Reliability
• Copper Adsorption Behavior on Silicon Substrates (Special Issue on Sub-Half Micron Si Device and Process Technologies)

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