Ryuta J | Mitsubishi Materials Corp. Saitama Jpn

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概要

• 同名の論文著者
• Mitsubishi Materials Corp. Saitama Jpnの論文著者

関連著者

• RYUTA Jiro

  Central Research Institute, Mitsubishi Materials Corporation

• Ryuta J

  Mitsubishi Materials Corp. Saitama Jpn

• Ryuta Jiro

  Central Research Institute Mitsubishi Materials Corporation

• SHINGYOUJI Takayuki

  Central Research Institute, Mitsubishi Materials Corporation

• Shingyouji Takayuki

  Central Research Inst. Mitsubishi Materials Corporation

• Kobayashi H

  Nagaoka Univ. Technol. Niigata Jpn

• Kobayashi H

  Department Of Earth & Spece Science Graduate School Of Science Osaka University

• SHIMANUKI Yasushi

  Mitsubishi Materials Silicon Corporation

• MORITA Etsuro

  Central Research Institute, Mitsubishi Materials Corporation

• Morita Etsuro

  Central Research Institute Mitsubishi Materials Corporation

• TAKAHASHI Isao

  Central Research Institute, Mitsubishi Materials Corporation

• KOBAYASHI Hiroyuki

  Central Research Institute, Mitsubishi Materials Corporation

• Shimanuki Y

  Mitsubishi Materials Silicon Corp. Chiba Jpn

• Shimanuki Yasushi

  Central Research Institute Mitsubishi Metal Corporation

• Shimanuki Yasushi

  Mitsubishi Materials Corp. Silicon Research Center

• Takahashi Isao

  Central Research Institute Mitsubishi Materials Corporation

• Kametani Hitoshi

  General Research Laboratory Mitubishi Electric Corporation

• Kondo H

  The Institute Of Scientific And Industrial Research Osaka University

• SHINGYOUJI Takayuki

  Mitsubishi Materials Silicon Corporation

• Shingyouji T

  Mitsubishi Materials Corp. Saitama Jpn

• YOSHIMI Toshihiro

  Mitsubishi Materials Silicon Corporation

• KONDO Hideyuki

  Central Research Institute, Mitsubishi Materials Corporation

• Kondo Hideyuki

  Central Research Institute Mitsubishi Materials Corporation

• Tanaka T

  Mitsubishi Materials Silicon Corporation

• SHIMANUKI Yasushi

  Central Research Institute, Mitsubishi Metal Corporation

• Kondo H

  Nikon Corp.

• Morita E

  Mitsubishi Materials Silicon Co. Ltd.

• OKADA Chizuko

  Central Research Institute, Mitsubishi Materials Corporation

• Okada Chizuko

  Central Research Institute Mitsubishi Materials Corporation

• Kobayashi H

  Pharmaceutical Research Institute Kyowa Hakko Kogyo Co. Ltd.

• Horikoshi Kaori

  Pharmaceutical Research Institute, Kyowa Hakko Kogyo Co., Ltd.

• Okuda Hitoshi

  Central Research Institute Mitsubishi Materials Corporation

• OKUDA Haruo

  NHK Science and Technical Research Laboratories

• TANAKA Toshiro

  Mitsubishi Materials Silicon Corporation

• TANAKA Toshiro

  Japan Silicon Co., Lid.

• Kishimoto Mikio

  Central Research Institute Mitsubishi Materials Corporation

• Kishimoto Mikio

  Central Research Department Hitachi Maxell Lid.

• KOBAYASHI Hideyuki

  Central Research Institute, Mitsubishi Materials Corporation

• Tanaka Toshiro

  Japan Silicon Co. Lid.

• KISHIMOTO Mikio

  Central Research Institute, Mitsubishi Materials Corporation

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著作論文

• Adsorption and Desorption of Metallic Impurities on Si Wafer Surface in SC1 Solution
• Effect of Crystal Pulling Rate on Formation of Crystal-Originated "Particles" on Si Wafers
• Crystal-Originated Singularities on Si Wafer Surface after SCl Cleaning
• Time-Dependent Variation of Composition of SC1 Solution
• Quantitative Analysis of Surface Contaminations on Si Wafers by Total Reflection X-Ray Fluorescence
• Measurement of Organic Matter on Si Wafer by Thermal Desorption Spectroscopy
• Growth of Native Oxide and Accumulation of Organic Matter on Bare Si Wafer in Air
• Study of Si Etch Rate in Various Composition of SC1 Solution

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