Choi Gil | Process Development Team Semiconductor R & D Center Samsung Electronics Co. Ltd.
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概要
Process Development Team Semiconductor R & D Center Samsung Electronics Co. Ltd. | 論文
- Innovative Al Damascene Process for Nanoscale Interconnects
- Optimum TiSi_2 Ohmic Contact Process for Sub-100nm Devices
- Investigation of the Contact Resistance between Ti/TiN and Ru in Metal-1/Plate Contacts of Ruthenium Insulator Silicon Capacitor
- Investigation of the Contact Resistance between Ti/TiN and Ru in Metal-1/Plate Contacts of Ruthenium Insulator Silicon Capacitor
- Innovative Al Damascene Process for Nanoscale Interconnects