Kim K | System Ic R&d Center Hynix Semiconductor Inc.
スポンサーリンク
概要
System Ic R&d Center Hynix Semiconductor Inc. | 論文
- Effects of N_2 Addition on Aluminum Alloy Etching in Inductively Coupled Plasma Source
- Bowing Profile Induced by Ion Implant Damage during Silicon Gate Etching
- Role of O_2 in Aluminum Etching with BCl_3/Cl_2/O_2 Plasma in High Density Plasma Reactor
- Effects of Gas Species on Charging Induced Tungsten Plug Corrosion during Post Metal Etch Process
- A new DRAM Cell for SoC (System on a Chip) Devices : Planar DRAM Cell, Based On Logic Process