Hino Isao | Opto-electronics Research Laboratories Nec Corporation
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概要
関連著者
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HINO Isao
Opto-Electronics Research Laboratories, NEC Corporation
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Hino Isao
Opto-electronics Research Laboratories Nec Corporation
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Suzuki T
Taiyo Yuden Co. Ltd. Gunma Jpn
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SUZUKI Tohru
Opto-Electronics Research Laboratories, NEC Corporation
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Suzuki Tohru
Opto-electronics And High-frequency Device Research Laboratories Nec Corporation
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GOMYO Akiko
Opto-Electronics Research Laboratories, NEC Corporation
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Gomyo Akiko
Fundamental And Environmental Research Laboratories Nec Corporation:optoelectronic Industry And Tech
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Gomyo Akiko
Opto-electronics Research Laboratories Nec Corporation
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Suzuki T
Free Electron Laser Research Institute Inc.
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Suzuki Tatsuro
Department Of Electrical Engineering Shizuoka University
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Hino I
Opto-electronics Research Laboratories Nec Corporation
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Suzuki T
Tdk Corp. Chiba Jpn
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Kawata S
Nikon Corp. Saitama Jpn
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Suzuki T
Nhk (japan Broadcasting Corp.) Tokyo
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Kobayashi K
Kobe Steel Ltd. Kobe Jpn
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KOBAYASHI Kenichi
Opto-Electronics Research Laboratories, NEC Corporation
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KAWATA Seiji
Opto-Electronics Research Laboratories, NEC Corporation
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Gomyo A
Nec Corp. Ibaraki Jpn
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Gomyo Akiko
Single Quantum Dot Project Erato Japan Science & Technology Corporation (jst) C
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Kawata Seiji
Opto-electronics Research Laboratories Nec Corporation
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Kobayashi Kenichi
Opto-electronics Research Laboratories Nec Corporation
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Hotta Hitoshi
Opto-electronics Research Laboratories Nec Corporation
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Hotta Hitoshi
Department Of Physics Faculty Of Science Tokyo Institute Of Technology
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IIJIMA Sumio
Fundamental Research Laboratories, NEC Corporation
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NISHIDA Katsuhiko
Opto-electronics Research Laboratories, Nippon Electric Co., Ltd.
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Iijima S
Fundamental Research Laboratories Nec Corporation
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Iijima Sumio
Fundamental Research Laboratories Nec Corporation
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Nishida Katsuhiko
Opto-electronics Research Laboratories Nippon Electric Co. Ltd.
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Fujii H
National Research Institute For Metals:crest Japan Science And Technology Corporation
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SUMINO Masayoshi
Opto-Electronics Research Laboratories, NEC Corporation
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UENO Yoshiyasu
Opto-Electronics Research Laboratories, NEC Corporation
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FUJII Hiroshi
Opto-Electronics Research Laboratories, NEC Corporation
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Hino Isao
Opto-electronics Research Laboratories Nippon Electric Co. Ltd.
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Fujii H
Opto-electronics Research Laboratories Nec Corporation
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Ueno Y
Networking Research Laboratories Nec Corporation:department Of Electronic Engineering University Of
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Ueno Yoshiyasu
Opto-electronics Research Laboratories Nec Corporation
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Ueno Yoshiyasu
Opto-electronics Research Laboratories Nec Corp.
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TORIKAI Toshitaka
Opto-electronics Research Laboratories, Nippon Electric Co., Ltd.
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IWASAKI Hideo
Opto-electronics Research Laboratories, Nippon Electric Co., Ltd.
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Ueno Yoshiyasu
Networking Research Laboratories Nec Corporation:department Of Electronic Engineering University Of
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Sumino Masayoshi
Opto-electronics Research Laboratories Nec Corporation
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Ueno Y
Nec Corp. Ibaraki Jpn
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Torikai Toshitaka
Opto-electronics Research Laboratories Nippon Electric Co. Ltd.
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Iwasaki Hideo
Opto-electronics Research Laboratories Nippon Electric Co. Ltd.
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SUZUKI Tohru
Opto-electronics Research Laboratories, Nippon Electric Co., Ltd.
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Fujii Hiroki
National Research Institute for Metals:CREST, Japan Science and Technology Corporation
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GOMYO Akiko
Opto-electronics Research Laboratories, Nippon Electric Co., Ltd.
著作論文
- Observation of a New CuPt-Type Ordered-Phase with Orientation in the [111]A Direction in Al_In_P Alloy
- Large (6°) Off-Angle Effects on Sublattice Ordering and Band-Gap Energy in Ga_In_P Grown on (001) GaAs Substrates
- Silicon and Selenium Doping Effects on Band-Gap Energy and Sublattice Ordering in Ga_In_P Grown by Metalorganic Vapor Phase Epitaxy
- Nonexistence of Long-Range Order in Ga_In_P Epitaxial Layers Grown on (111)B and (110) GaAs Substrates : Semiconductors and Semiconductor Devices
- High Aluminum Composition AlGaInP Grown by Metalorganic Chemical Vapor Deposition : Impurity Doping and 590 nm (Orange) Electroluminescence
- MOCVD-Grown Al_In_P-Ga_In_P Double Heterostructure Lasers Optically Pumped at 90 K
- Encapsulated Thermal Oxidation for Ge-APDs Passivation