Encapsulated Thermal Oxidation for Ge-APDs Passivation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1982-12-20
著者
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HINO Isao
Opto-Electronics Research Laboratories, NEC Corporation
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NISHIDA Katsuhiko
Opto-electronics Research Laboratories, Nippon Electric Co., Ltd.
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Hino Isao
Opto-electronics Research Laboratories Nippon Electric Co. Ltd.
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TORIKAI Toshitaka
Opto-electronics Research Laboratories, Nippon Electric Co., Ltd.
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IWASAKI Hideo
Opto-electronics Research Laboratories, Nippon Electric Co., Ltd.
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Nishida Katsuhiko
Opto-electronics Research Laboratories Nippon Electric Co. Ltd.
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Hino Isao
Opto-electronics Research Laboratories Nec Corporation
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Torikai Toshitaka
Opto-electronics Research Laboratories Nippon Electric Co. Ltd.
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Iwasaki Hideo
Opto-electronics Research Laboratories Nippon Electric Co. Ltd.
関連論文
- Observation of a New CuPt-Type Ordered-Phase with Orientation in the [111]A Direction in Al_In_P Alloy
- Large (6°) Off-Angle Effects on Sublattice Ordering and Band-Gap Energy in Ga_In_P Grown on (001) GaAs Substrates
- Silicon and Selenium Doping Effects on Band-Gap Energy and Sublattice Ordering in Ga_In_P Grown by Metalorganic Vapor Phase Epitaxy
- Nonexistence of Long-Range Order in Ga_In_P Epitaxial Layers Grown on (111)B and (110) GaAs Substrates : Semiconductors and Semiconductor Devices
- High Aluminum Composition AlGaInP Grown by Metalorganic Chemical Vapor Deposition : Impurity Doping and 590 nm (Orange) Electroluminescence
- MOCVD-Grown Al_In_P-Ga_In_P Double Heterostructure Lasers Optically Pumped at 90 K
- Encapsulated Thermal Oxidation for Ge-APDs Passivation