MATSUMOTO Takeshi | Joining and Welding Research Institute, Osaka University
スポンサーリンク
概要
関連著者
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OHTSU Yasunori
Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Sag
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MIYAKE Shoji
Joining and Welding Research Institute, Osaka University
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FUJITA Hiroharu
Department of Electrical and Electronic Engineering, Saga University
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MATSUMOTO Takeshi
Joining and Welding Research Institute, Osaka University
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NIINO Atsushi
Joining and Welding Research Institute, Osaka University
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三宅 正司
阪大溶接研
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YONESU Akira
Department of Electrical Engineering, University of Ryukyu
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Yonesu Akira
Department Of Electrical And Electronic Engineering Faculty Of Engineering Ryukyu University
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三宅 正司
近畿大学リエゾンセンター
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Fujita Hisanori
Institute Of Laser Engineering Osaka University
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Fujita H
Institute Of Industrial Science The University Of Tokyo
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三宅 正司
大阪大学大学院工学研究科
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藤田 寛治
佐賀大学
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Fujimori Hiroyasu
Institute Of Material Research Tohoku University
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Okuno Y
Department Of Electrical Engineering Saga University
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MISAWA Tatsuya
Department of Electrical and Electronic Engineering, Faculty of Science and Engineering, Saga Univer
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Niino Atsushi
Joining And Welding Research Institute Osaka University
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Misawa Tatsuya
Department Of Electrical And Electronic Engineering Faculty Of Science And Engineering Saga Universi
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Miyake Shoji
Joining & Welding Resarch Institute Osaka University
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Ohtsu Yasunori
Department Of Electrical & Electronic Engineering Saga University
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Fujita H
Center For International Research On Micromechatronics (cirmm) Institute Of Industrial Science (iis)
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Fujita Hiroharu
Department Of Electrical And Electronic Engineering Saga University
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Fujita H
Limms/cnrs-iis The University Of Tokyo Crest/jst
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Miyake Shoji
Welding Research Institute Of Osaka Univ.
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Fujita Hiroyuki
Inst. Of Industrial Sci. The Univ. Of Tokyo
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Fujita Hiroharu
Department Of Electrical & Electronic Engineering Saga University
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Matsumoto Takeshi
Joining And Welding Research Institute Osaka University
著作論文
- Influence of Substrate Biasing on (Ba, Sr)TiO_3 Films Prepared by Electron Cyclotron Resonance Plasma Sputtering
- Energy Distribution of Ions Incident onto a Dc-Biased Substrate in Electron Cyclotron Resonance Sputtering Plasma for SrTiO_3 Thin Film Preparation