SHIMOKAWA Ryuichi | National Institute of Advanced Industrial Science and Technology
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概要
- Shimokawa Ryuichiの詳細を見る
- 同名の論文著者
- National Institute of Advanced Industrial Science and Technologyの論文著者
関連著者
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SHIMOKAWA Ryuichi
National Institute of Advanced Industrial Science and Technology
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Sakata Isao
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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YAMANAKA Mitsuyuki
National Institute of Advanced Industrial Science and Technology
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Sakata Isao
National Institute Of Advanced Industrial Science And Technology (aist)
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TAKATO Hidetaka
National Institute of Advanced Industrial Science and Technology (AIST)
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Sakata Isao
Toyo-hakka Co. Ltd.
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Shimokawa R
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Takato H
National Institute Of Advanced Industrial Science And Technology (aist)
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Miyake Yukiharu
Eko Instruments Trading Co. Ltd.
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IKEDA Hirosi
EKO Instruments Trading Co., Ltd.
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MLYAKE Yukiharu
EKO Instruments Trading Co., Ltd.
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IGARI Sanekazu
Japan Quality Assurance Organization (JQA)
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Mlyake Yukiharu
Eko Instruments Trading Co. Ltd.
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Ikeda Hirosi
Eko Instruments Trading Co. Ltd.
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Shimokawa Ryuichi
National Institute of Advanced Industrial Science and Technology, AIST Tsukuba Central-2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
著作論文
- Band Lineup at the Interface between Boron-Doped P-Type Hydrogenated Amorphous Silicon and Crystalline Silicon Studied by Internal Photoemission
- Quinhydrone/Methanol Treatment for the Measurement of Carrier Lifetime in Silicon Substrates : Semiconductors
- Surface Passivation Effect of Silicon Substrates due to Quinhydrone/Ethanol Treatment(Semiconductors)
- Development of Wide Field-of-View Cavity Radiometer for Solar Simulator Use and Intercomparison between Irradiance Measurements based on the World Radiometer Reference and Electrotechnical Laboratory Scales
- Very Low Temperature Epitaxial Growth of Silicon Films for Solar Cells
- Band Lineup at the Interface between Boron-Doped P-Type Hydrogenated Amorphous Silicon and Crystalline Silicon Studied by Internal Photoemission
- Back-Surface-Field Effects at the Heterojunctions between Boron-Doped p-Type Hydrogenated Amorphous Silicon and Crystalline Silicon in Thin-Film Crystalline Silicon Solar Cells