Ohashi Haruhiko | Japan Synchrotron Radiation Research Institute Experimental Facilities Division
スポンサーリンク
概要
関連著者
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Ueno Masato
Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S
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Ohashi Haruhiko
Japan Synchrotron Radiation Research Institute Experimental Facilities Division
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Kanashima Takeshi
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Kohma Norinao
Area Of Materials And Device Physics Department Of Physical Science Graduate School Of Engineering S
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UENO Masato
Department of Neurosurgery, Osaka Neurological Institute
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OKUYAMA Masanori
Department of Electrical Engineering, Facully of Engineering Science, Osaka University
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OHASHI Haruhiko
Japan Synchrotron Radiation Research Institute
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KANASHIMA Takeshi
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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KANASHIMA Takeshi
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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MAIDA Osamu
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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KOHMA Norinao
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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AGATA Masashi
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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YUDATE Shinji
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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OKUYAMA Masanori
Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering
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MAIDA Osamu
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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KOHMA Norinao
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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SHIBUYA Akira
Department of Physical Science, Graduate School of Engineering Science, Osaka University
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OHASHI Haruhiko
Experimental Facilities Division, Japan Synchrotron Radiation Research Institute
著作論文
- Synchrotron Radiation-Induced Nitrization and Oxidation on Si Surface at Low Temperature
- Evaporation and Expansion of Poly-tetra-fluoro-ethylene Induced by Irradiation of Soft X-Rays from a Figure-8 Undulator