Sandler N | Lam Research Corporation Cvd Business Unit

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概要

• 同名の論文著者
• Lam Research Corporation Cvd Business Unitの論文著者

関連著者

• Lau W

  Lam Res. Corp. California Usa

• Lau Wai

  Department Of Electrical Engineering National University Of Singapore

• Sandler N

  Lam Research Corporation Cvd Business Unit

• Lau Wai

  Centre For Optoelectronics Department Of Electrical Engineering National University Of Singapore

• SANDLER Nathan

  Lam Research Corporation, CVD Business Unit

• CHU Paul

  Department of Physics and Materials Science, City University of Hong Kong

• Chu P

  City Univ. Hong Kong Hong Kong Chn

• Chu Paul

  Department Of Physics And Materials Science City University Of Hong Kong

• Qian Peng

  Department Of Electrical Engineering National University Of Singapore

• MCKINLEY Kevin

  Lam Research Corporation, CVD Business Unit

• Mckinley Kevin

  Lam Research Corporation Cvd Business Unit

• Tung Chih

  Institute Of Microelectronics Department Of Failure Analysis And Reliability

• PERERA Merinnage

  Department of Electrical Engineering, National University of Singapore

• BABU Premila

  Department of Electrical Engineering, National University of Singapore

• OW Aik

  Department of Electrical Engineering, National University of Singapore

• HAN Taejoon

  Lam Research Corporation, CVD Business Unit

• SHENG Tan

  Institute of Microelectronics, Department of Failure Analysis and Reliability

• Ow Aik

  Department Of Electrical Engineering National University Of Singapore

• Sheng Tan

  Institute Of Microelectronics Department Of Failure Analysis And Reliability

• Han Taejoon

  Lam Research Corporation Cvd Business Unit

• Babu Premila

  Department Of Electrical Engineering National University Of Singapore

• Perera Merinnage

  Department Of Electrical Engineering National University Of Singapore

• Perea Merinnage

  Department of Electrical Engineering, National University of Singapore

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著作論文

• Evidence that N_2O is a Stronger Oxidizing Agent than O_2 for the Post-Deposition Annealing of Ta_2O_5 on Si Capacitors
• The Superiority of N_2O Plasma Annealing over O_2 Plasma Annealing for Amorphous Tantalum Pentoxide (Ta_2O_5) Films

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