OSHITA Takaya | SEKISUI CHEMICAL Co., Ltd.
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概要
SEKISUI CHEMICAL Co., Ltd. | 論文
- Formation of Silicon Oxynitride Films with Low Leakage Current Using N_2/O_2 Plasma near Atmospheric Pressure
- Formation of Silicon Oxynitride Films with Low Leakage Current Using N2/O2 Plasma near Atmospheric Pressure
- Incubation-Free Growth of Polycrystalline Si Films by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Discharge under Near Atmospheric Pressure
- GaN Film Fabrication by Near-Atmospheric Plasma-Assisted Chemical Vapor Deposition
- Investigation of Cell-Gap Defects Using Gap Simulation(Electronic Displays)