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SEKISUI CHEMICAL Co., Ltd. | 論文
- Formation of Silicon Oxynitride Films with Low Leakage Current Using N_2/O_2 Plasma near Atmospheric Pressure
- GaN Film Fabrication by Near-Atmospheric Plasma-Assisted Chemical Vapor Deposition
- Investigation of Cell-Gap Defects Using Gap Simulation(Electronic Displays)
- A105 Development of the New Heat Supply Unit for the Neighboring Communities Co-generation System
- 1B-2-2 Physiological responses of the balneotherapy using dead sea water, artificial sea water and fresh water in women (Proceedings of the 39th Meeting of Japan Society of Physiological Anthropology)
- Dechlorination of polyvinyl chloride by its grinding with KOH and NaOH
- Mechanochemical dechlorination of polyvinyl chloride by co-grinding with various metal oxides
- Ball mill simulation and powder characteristics of ground talc in various types of mill
- Amorphization of kaolinite and media motion in grinding by a double rotating cylinders mill-a comparison with a tumbling ball mill
- Simulation of Operational Power of Co-Axial Double Rotating Cylinders Mill by Particle Element Method
- Formation of Silicon Oxynitride Films with Low Leakage Current Using N2/O2 Plasma near Atmospheric Pressure
- Incubation-Free Growth of Polycrystalline Si Films by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Discharge under Near Atmospheric Pressure